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Study of MOSFET Low Frequency Noise Source Fluctuation Using a New Fully Programmable Test Set‐up
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PDF) New techniques to characterize properties of advanced dielectric barriers for sub-65nm technology node | M. Veillerot - Academia.edu
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Numerical Analysis of the Reliability of Cu/low-k Bond Pad Interconnections Under Wire Pull Test: Application of a 3D Energy Bas
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